CMOS Scaling : Era of TMDs

Date:

This presentation was given as a part of the course EE6346 : Advanced CMOS Devices and Technologies.

As a part of EE6346 offered by Prof. Deleep Nair in the Jan-May 2025 semester at IIT Madras, I gave a presentation on the future of CMOS Scaling. During the talk, I focused on 2D materials and their promising role as channel materials for next-generation, advanced semiconductor nodes. I also discussed some key highlights of two recent publications on 2D materials at VLSI ‘25 and IEDM ‘24. The links to the papers are attached below.

Scaling 2D materials to 300mm

1nm EOT Gate Dielectric

Recording